The effect of the sputtering parameters on the ITO films deposited by RF magnetron sputtering

Date
2011
Authors
Jung, Jihoon
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Abstract

TCO materials have many application you can experience everywhere like touch panel, LCD, heater for airplane glass. Among TCO materials, ITO is one of the most widely used for its high conductivity and transparency. Although many ways of deposition of ITO thin films are available, RF magnetron sputtering deposition is the most efficient way for high transparency, conductivity and reproducibility. In this work, sputtering parameters such as the working pressure, power, oxygen partial pressure, and substrate temperature have been optimized for its high conductivity and transparency.

Description
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Keywords
ITO, RF MAGNETRON SPUTTERING, TCO materials
Citation
Department
Electrical and Computer Engineering