The effect of the sputtering parameters on the ITO films deposited by RF magnetron sputtering

Date

2011

Authors

Jung, Jihoon

Journal Title

Journal ISSN

Volume Title

Publisher

Abstract

TCO materials have many application you can experience everywhere like touch panel, LCD, heater for airplane glass. Among TCO materials, ITO is one of the most widely used for its high conductivity and transparency. Although many ways of deposition of ITO thin films are available, RF magnetron sputtering deposition is the most efficient way for high transparency, conductivity and reproducibility. In this work, sputtering parameters such as the working pressure, power, oxygen partial pressure, and substrate temperature have been optimized for its high conductivity and transparency.

Description

This item is available only to currently enrolled UTSA students, faculty or staff. To download, navigate to Log In in the top right-hand corner of this screen, then select Log in with my UTSA ID.

Keywords

ITO, RF MAGNETRON SPUTTERING, TCO materials

Citation

Department

Electrical and Computer Engineering